Transfer-conditon optimization of an electrochemical-based nanoimprint lithography for 1:1 transfer of thin-film edge electrodes

A mold with a functional on the top surface of protrusion patterns is introduced to prevent meniscus extension and to improve contact uniformity for high resolution and uniform transfer. Design of experiments (DOE) is conducted to optimize the transfer conditions of the thin-film edge electrode lithography for high resolution. As a result, 1:1 uniform transfer of oxide patterns with a line-width of 25nm is achieved successfully.