SADP core etching performance comparison for different CCP etchers

As technology developed, semiconductor moves to 10nm and the beyond. Since pitch becomes tighten and tighten, double patterning and triple patterning attracted researchers' attention
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. Self-aligned double patterning (SADP) is one of the most popular double patterning methods. The primary idea of SADP is the core and spacer fabrication
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. Herein, three commercial CCP etchers are employed for core etching tuning. Results show that both temperature and pressure are propitious to CD and beneficial to profile control.