MC3 V-Curve Characteristics in Low Energy Implantation

In ion implantation, repeatability of sheet resistances (Rs) is indispensable for process stability monitoring. In the course of process development, we found Rs instability in some implant conditions such as B
⁺
, 7keV, and 9E13cm
^-2
with tilt of 7̊ and twist of 22̊. To understand the reason, we focused on the influence of implant angle conditions and obtained V-Curves for conditions in which the ion angle deviation (IAD) was changed. We discovered that IAD influences Rs values not only in a channeling condition but also in an off-channeling condition.