Applications of mathematical systems science to nanolithography of integrated circuits

An overview is given describing applications of multivariable control, signal processing, optimization, modeling and computation to the lithography sequence. We discuss areas in the patterning process where mathematical methods can play a significant role including optical proximity correction, phase shifting mask design, alignment, and stage control for nanopositioning. We also include a discussion on systems applications in the general area of photoresist processing for lithography with emphasis on the thermal process.