Fabrication of micropolarizers by electron beam lithography

A method for the fabrication of micropolarizer arrays by electron beam lithography was presented. The experimental results have illustrated the influences of exposure dose on the performance parameters of wire grids. The maximum transmittance and extinction ratios of wire grid arrays were obtained in the visible spectrum and the comparison results of the different depths of wire grids demonstrate the superiority of high depths. The performance of the two structures has shown that this work offers the possibility to improve the properties of the micropolarizers.