Visualization of plasma source ion implantation for arrays of multiple targets

Visualization of sheath overlap dynamics during plasma source ion implantation (PSII) of a multiple-target array is used to illustrate the effect of target spacing on dose uniformity over the surface of a single target. The simulations are conducted using a hybrid plasma model, and the images are created using the Tecplot package by Amtec. The simulations suggest scaling rules for sheath overlap time as a function of target spacing.