Inductive plasma sources for plasma implantation and deposition

External and reentrant radio frequency inductive plasma sources are developed for plasma ion implantation and deposition processes in a 1.8 m/sup 3/ vacuum vessel. Plasma densities in the range 10/sup 16/-10/sup 17/ m/sup -3/ desirable for the above processes. External plasma sources could not yield the required plasma densities because of high particle losses in the transition region between the source and the main vessel. The particle losses are clarified through experiments and analysis, with and without multipole magnetic confinement. Reentrant plasma sources eliminate transmission losses and yield high plasma densities with good spatial uniformity.