Deposition of polymeric thin films by ionization-assisted method

The author is specifically involved in a novel deposition technique that is called ionization-assisted deposition (IAD) method. The IAD method is an extension of the vacuum deposition by ionizing and accelerating a part of the evaporated material toward the substrate. It has been shown that this method has the advantage of controlling the film quality, such as crystallinity and surface morphology due to its flexible control of film formation condition by adjusting the amount and energy of ions. This paper describes the application of IAD for the preparation of polymeric thin films in three different concepts.