A study of the surface passivation on GaAs and In/sub 0.53/Ga/sub 0.47/As Schottky-barrier photodiodes using SiO/sub 2/, Si/sub 3/N/sub 4/ and polyimide

Studies of surface passivation and antireflection coating on GaAs and In/sub 0.53/Ga/sub 0.47/As interdigitated metal-semiconductor-metal (IMSM) Schottky-barrier photodiodes have been made using SiO/sub 2/, Si/sub 3/N/sub 4/, and polyimide deposited films. The results show that Si/sub 3/N/sub 4/ on GaAs and polyimide on In/sub 0.53/Ga/sub 0.47/As are the most effective dielectric films for reducing the leakage current and reflection loss in these photodiodes.<
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