Yield Enhancement Of An Advanced Poly-Emitter Complementary Bipolar Technology

This paper presents a methodology for the enhancement of VLSI process manufacturability with TCAD tools. Once the fabrication equipment fluctuations are characterized, Monte Carlo simulations and sensitivity analyses are used to design corrective actions that minimize process variability, thus improving the manufacturability. This approach was successfully implemented in an advanced bipolar technology at Harris, resulting in a 15% improvement in yield.