Multiscale statistically correlated variability: A unified model for computer-aided design

A simple analytical model of statistically correlated variability that unifies local and global variations is presented. This model is compatible with computer-aided design (CAD) implementation, and covers device dimension-dependent mismatch, distance-dependent mismatch, and statistical across-chip variations in a single formulation. It is able to describe the effect of correlated variability sources at all scales, including the case where variability source features components with correlation lengths of the order of magnitude of typical device dimensions. This approach generalizes Pelgrom's analysis and can be easily implemented in CAD tools for Monte Carlo simulations of multiscale variability.