Anomalous dielectric dispersion in tantalum oxide films prepared by RF sputtering

Dielectric properties (/spl epsiv/ and tan /spl delta/) of thin sputtered tantalum oxide films have been measured in the low frequency range. Anomalous large values of /spl epsiv/ and tan /spl delta/ have been observed at high temperatures above 100/spl deg/C. The explicit thickness dependence exists in the frequency dependence of /spl epsiv/ and tan /spl delta/. These results have been interpreted by Maxwell-Wagner theory.