Modeling 20-nm Germanium FinFET With the Industry Standard FinFET Model

In this letter, we present modeling results for germanium p-type FinFETs using the industry standard Berkeley Spice Common Multi-gate Field Effect Transistor (BSIM-CMG) model. The effect of perpendicular electrical field on hole mobility in germanium FinFETs is found to be different from silicon FinFETs. We present an updated Ge mobility equation to account for this difference. With this single update, BSIM-CMG agrees very well with the measured
I-V
data of Ge FinFETs with a gate-length from 130 to 20 nm. We conclude that a production quality standard model is available for simulation of circuits employing p-type Ge FinFET.