A new concept of p/sup -/(n/sup -/)/p/sup -/(n/sup -/) thin-film epitaxial silicon wafers for MOS ULSI's that ensures excellent gate oxide integrity

A new concept of epitaxial silicon (Si) wafers (NC epi) in which p/sup -/(n/sup -/) thin-film layers are grown on p/sup -/(n/sup -/) Czochralski (CZ)-Si substrates (substrate resistivity: approximately 10 /spl Omega/ cm) is proposed for metal oxide semiconductor (MOS) ultra large-scale integrated circuits (ULSI's) as a starting material. A thickness of 0.3-1 /spl mu/m for the epitaxial layer (p/sup -//p/sup -/ structure) is shown to be sufficient for improving the gate oxide integrity for MOS-ULSI's. The epitaxial layer grown on Si substrate greatly reduces weak spots in the gate oxide layer by covering microdefects in the CZ-Si represented by the crystal originated particle (COP). The p/sup -//p/sup $/thin-film epitaxial structure results in very controlled resistivity for the electrically active region in the device, which in turn results in a lower growth cost and higher feasibility for use in current ULSI's. The features of NC epi in combination with proximity gettering is presented. An application of NC epi in shallow-trench isolation processes is discussed, considering the retrograde-type well-tub. The amenability of epitaxial wafers to wafer enlargement (over 300 mm) is discussed to eliminate the bad effects of COP.