Fully Ion Implanted and Coactivated Industrial n-Type Cells With 20.5% Efficiency

We present our progress in fully implanted n-type cell for industrial manufacturing. Screen-printed n-type cells with boron emitters are a viable contender to succeed p-type cell in industrial production. A major open topic is the availability of a robust manufacturing flow. The synergistic qualities of ion implantation allow for a very efficient and potentially robust process sequence. We review some of the challenges arising from this approach, such as activation of the implanted boron emitter and the reverse current characteristics. Or current process allows manufacturing of 156 × 156 mm
²
cells with efficiencies up to 20.5% with a single coactivation anneal.