A Designer's Guide to Subresolution Lithography: Enabling the Impossible to Get to the 14-nm Node [Tutorial]

Device scaling with manufacturing methods that overcome the inherent limits of optical lithography is a constant focus of the microelectronics industry. The authors of this tutorial article review the state-of-the-art and major challenges of subresolution lithography, and discuss modern double-patterning lithography solutions and supporting EDA tools to surpass them.