InAs/GaAs Quantum-Dot Lasers Monolithically Grown on Si, Ge, and Ge-on-Si Substrates

The realization of semiconductor lasers on Si substrates will enable the fabrication of complex optoelectronic circuits. This will permit the creation of the long-dreamed chip-to-chip and system-to-system optical interconnects. This paper reports recent developments in our work on InAs/GaAs quantum-dot (QD) lasers monolithically grown on Si, Ge, and Ge-on-Si (Ge/Si) substrates. A thin AlAs nucleation layer (NL) was first investigated for the growth of InAs/GaAs QDs on Si substrates. The AlAs NL enables more defects to be confined in the interface between the GaAs epitaxial layer and Si substrate, and hence leads to higher photoluminescence intensity for InAs/GaAs QDs. Room-temperature lasing at 1.29 μm with a threshold current density of 650 A/cm
²
was demonstrated with the use of an AlAs NL. The growth of InAs/GaAs QDs on Ge and Ge/Si substrates was further studied. A low threshold current density of ~200 A/cm
²
for 1-mm long QD lasers has been demonstrated for QD lasers grown on Ge substrates by using Ga prelayer technique. This growth technique has also been explored for Ge/Si substrates. Room-temperature lasing at 1.28 μm with threshold current density of ~164 A/cm
²
and lasing operation up to 84°C has been demonstrated for a 3-mm long device.