Computer simulation of high brightness and high beam current electron gun for high-throughput electron beam lithography

The purpose of the present study is to examine the feasibility of a high brightness and high beam current electron gun with an elongated lifetime from perspective of computer simulation. We propose a novel electron gun system with LaB
₆
cathode which is operated at Schottky emission mode under slightly lower temperature condition than that typically used for thermionic emission mode. The design of the electron gun system and the operational condition are optimized so that both the brightness and the beam current are high enough for high-throughput electron beam lithography.