Refractive Index Profile in Photorefractive-Damage-Resistant Near-Stoichiometric Ti:Mg:Er: $\hbox{LiNbO}_{3}$ Strip Waveguide

Refractive index profile in photorefractive-damage-resistant near-stoichiometric (NS) single-mode Ti:Mg:Er:
$\hbox{LiNbO}_{3}$
strip waveguide is constructed from the measured mode field distribution. Like the conventional congruent Ti:
$ \hbox{LiNbO}_{3}$
waveguide, the Ti-induced refractive index increase in the NS waveguide studied here follows a sum of two error functions in the width direction and a Gaussian function in the depth direction. Based upon the established index profile model, the mode sizes were calculated using the variational method and compared with the experimental results. The Ti-induced index increment at the NS waveguide surface was also evaluated according to the empirical relation previously reported for the conventional congruent Ti:
$\hbox{LiNbO}_{3}$
waveguide and compared with the data deduced from the mode field distribution. All comparisons show good agreement, showing that the index model proposed is close to the practical scenario.