Microscopic magnetic characterization of submicron cobalt islands prepared using self-assembled polymer masking technique

Patterns of submicron cobalt islands were created on silicon by using self-assembled co-polymers as etching masks. The synthesis conditions were varied to create specific magnetic island morphologies. The magnetic structure and magnetization reversal of interconnected, as well as interacting and non-interacting islands were systematically studied using magnetic force microscopy. Differences in magnetic characteristics were observed and correlated with the thin film morphologies. The result of these studies include the transition from single to multidomain configuration as a function of island size, domain boundary characteristics near coercivity, evidence of magnetization rotation with increasing reverse magnetic field, and evidence of collective switching behavior in interacting single domain islands.