Nanoscale 2-Bit/Cell HfO $_{\bf 2}$ Nanocrystal Flash Memory

In this paper, we demonstrate 50-nm trigate nonvolatile HfO
₂
nanocrystal memory devices on silicon-on-insulator wafers. The proposed technique, which is fully compatible with current CMOS technologies, is used to form highly localized HfO
₂
nanocrystals for application in nonvolatile flash memory. We successfully scale down conventional nonvolatile floating gate memories below the 50-nm node to achieve nanodevices for application in next-generation nonvolatile memories.