Reactive ion etching of barium strontium titanate/oxide composites

The reactive ion etching (RIE) method was used for patterning of the oxide composites of barium strontium titanium oxide (BSTO) thin films. We discuss the RIE parameters of not only the undoped BSTO thin films but also that of the oxide composites of the BSTO thin films. The reason for this study is to establish the parameters necessary for patterning the thin films for applications in high frequency coplanar phase shifter elements to be used in e-scan antennas. The thin films were deposited by the pulsed laser ablation (PLD) method.