On the oxide thickness extraction in deep-submicron technologies

Thickness measurement of ultrathin oxides is more and more difficult due to the oxide thickness scale down following the supply voltage decrease in deep-submicron technologies. This paper discusses the drawbacks of the already existing extraction methods and proposes an original approach which has various advantages. This extraction procedure, based on the plot 1/C vs 1/(V/sub G/-V/sub FB/) obtained by classical C-V measurements, can be easily implemented and provides more accurate oxide thickness results.