Effect of substrate pretreatment on the field emission property of nano-amorphous carbon film

As a function of a new type of thin film materials, amorphous carbon films in mechanical, electronic, optical, biological and other fields, in particular, vacuum microelectronic devices have a wide range of applications [1–3], so a lot of work devoted to the research their Field emission properties. In order to enhance the field emission properties, the research teams adopted different methods, such as plasma treatment, surface mixed, using different transition metals. However, there are only a few reports about using polishing process to enhance the field emission properties of amorphous carbon films. In this paper, nano-amorphous carbon films were synthesized on Si substrates by microwave plasma enhances chemical vapor deposition (MPCVD). In order to improve its field emission properties, prior to the deposition of thin films, substrates were first mechanically polished,especially investigated the influence of polishing process of substrates on field emission of the nano-amorphous carbon films were especially investigated.