Investigation of surface properties on Indium Thin Oxide films modified by MirroTron Sputtering system

Indium Tin Oxide (ITO) film is evaporated on the PEN film using MirrorTron Sputtering system, which is a new sputtering system enabling sputter deposition at a low temperature, separating a sputtering chamber and a deposition chamber. As a result, a uniform ITO thin-film deposition with a film thickness of 150 nm is enabled. This ITO thin-film is chemically analyzed using Focused ion beam and X-ray photoelectron spectroscopy. As a result, good thin-film condition is confirmed.