Optimization of implant and anneal processes

A method of choosing a coupled pair of a doping process and an annealing process that is optimized on the basis of the R
s
·x
j
figure of merit. Differential Hall effect evaluations are used to measure 1/µ
def
, the defect scatter contribution to the mobility. Supressing 1/µ
def
leads to optimization of the doping process-annealing process couple.