Nitrogen plasma immersion ion implantation of metals with a 2.45 GHz microwave source

Results on Plasma Immersion Ion Implantation (Pill) of nitrogen ions into a metal surface using microwave plasma source are described. Preliminary results in our benchtop PIII system with microwave source showed successful N/sup +/ implantation in an Al sample but indicated the necessity of better plasma optimization and confirmed a need for a high repetition rate, negative high voltage pulser which is presently under development.