Effects of K-rich in the targets and fabrication parameters on 0.95(K0.48Na0.52NbO3)-0.05(LiSbO3) films by pulsed laser deposition

0.95(K
_0.48
Na
_0.52
NbO
₃
)-0.05(LiSbO
₃
) (95KNN-5LS) thin films have been fabricated by pulsed laser deposition (PLD) on Pt/Ti/SiO
₂
/Si substrates. The K-rich in the target and the fabrication parameters on the properties of the films was investigated. The results show that good films can be obtained with the 0.95(K
_0.48
Na
_0.52
NbO
₃
)-0.05(LiSbO
₃
)-0.0228K
₂
CO
₃
(95KNN-5LS-4.56K) target, and the surface roughness, film orientation, composition and properties of the films are strongly dependent on the oxygen pressure and oblique angle from the plume axial direction in PLD process.