Optical scanning probe system for electromagnetic near field measurements

An optical scanning electromagnetic field probe system, consisting of an electro-optic or magneto-optic crystal substrate and a galvano scanner, has been developed for high speed, low-invasive measurement of electromagnetic near field distribution. We demonstrate the measurement of electric field distributions using a LiNbO
₃
crystal substrate and the probe system. We also measure magnetic field distributions above a microstrip line in the gigahertz range using a magnetic garnet thin film. The probe system is also used for measuring electromagnetic field distributions above a commercially available IC.