A methodology for the top-down synthesis of semiconductor process flows

Increasing expense of developing microelectronic manufacturing technology threatens to slow the growth of the electronics industry. This paper describes the progress we have made in developing methodologies and techniques to reduce the cost of designing microelectronic manufacturing flows. Our approach is to partition the task of process flow design into a number of abstraction levels and provide mechanisms to translate between these levels. This approach results in a top-down design methodology where requirements from higher levels of abstraction are successively reduced to lower abstraction levels, while meeting the constraints imposed by the lower levels. The paper enumerates the abstraction levels we have identified so far, and describes the translation mechanisms for a class of process design tasks: modification of an existing flow in response to change in performance requirements. Finally, we briefly describe a design environment that incorporates these ideas.