Holographic photolithography for submicron VLSI structures

A holographic method of photolithographically printing the image of a photomask into a photoresist is presented. The holographic system, which can operate at either visible or UV wavelengths has been developed for high resolution VLSI integrated circuit manufacture. Submicron images of various typical IC features have been faithfully recorded using both the visible and UV wavelengths. The holographic system has also been integrated into a semiautomatic machine, proving the feasibility of integrating and developing the technology into a commercially viable product.<
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