Computational studies for an advanced design ECR ion source

An innovative technique for increasing ion source intensity is described which, in principle, could lead to significant advances in ECR ion source technology for multiply charged ion beam formation. The advanced concept design uses a minimum-B magnetic mirror geometry which consists of a multi-cusp, magnetic field, to assist in confining the plasma radially, a flat central field for tuning to the ECR resonant condition, and specially tailored mirror fields in the end zones to confine the plasma in the axial direction. The magnetic field is designed to achieve an axially symmetric plasma "volume" with constant mod-B, which extends over the length of the central field region. This design, which strongly contrasts with the ECR "surfaces" characteristic of conventional ECR ion sources, results in dramatic increases in the absorption of RF power, thereby increasing the electron temperature and "hot" electron population within the ionization volume of the source.