Charge trapping properties of N/sub 2/O-treated NH/sub 3/-nitrided oxides under high-field stress

A new technique, namely N/sub 2/O treatment of NH/sub 3/-nitrided oxides (NON20), is proposed to fabricate thin oxide. It is shown that the N/sub 2/O treatment is superior to conventional reoxidation step in improving charge trapping property and interface hardness of oxides under high-field stress.