Multi-layered fabrication of microstructures and thin film transistors-application to polycrystalline silicon field emitters controlled by TFTs

We have fabricated a new multi-layered structure of a polycrystalline silicon field emitter array (poly-Si FEA) on top of a thin film transistor (TFT) by successive application of micromachining, TFT fabrication, and wafer bonding and dissolving processes. The TFT not only controls the field emission but also stabilizes it. Since the TFT does not consume the space for the poly-Si FEA fabrication, the structure will be a good candidate for high quality flat panel displays. In this paper, we demonstrate fabrication of the multi-layered structure and show a successful emission control by the TFT.