Results of modeling laser-induced plasma in pulsed laser deposition

Pulsed laser deposition (PLD) as a method for thin-film deposition is distinguished by high energy and density of the short-time particle flow. By interaction of the laser radiation with the solid and the expanding cloud, a more or less ionized plasma is formed, depending on the wavelength and pulse shape. The properties of the deposit depend essentially on the properties of the plasma, as energy content, density, degree of ionization, and composition. Because of the complexity of the phenomena involved, controlling the particle flow requires experimental analysis as well as theoretical modeling. The visualization of some experiment-related results of theoretical modeling is shown for irradiation of Al targets with different lasers and regimes.