Electron transport in Gate-All-Around uniaxial tensile strained-Si nanowire n-MOSFETs

The intrinsic performance and electron effective mobility of uniaxially strained-Si gate-all-around (GAA) NanoWire (NW) n-MOSFETs are investigated, for the first time. Suspended strained-Si NWs show very high stress (up to ~2.1 GPA) as confirmed by Raman, with no bending of the wires. GAA strained-Si NW n-MOSFETs exhibit excellent subthreshold swing, and current drive and transconductance enhancement of ~2X over unstrained Si control NW devices. The mobility enhancement of these devices over unstrained planar and GAA MOSFETs as well as their scalability to circular NWs with radius of ~4 nm are also demonstrated.