Resonant interband tunneling device with multiple negative differential resistance regions

The first observations of multiple negative differential resistance (NDR) regions in resonant interband tunneling devices are reported. In vertically integrated poly-type heterostructures of InAs/AlSb/GaSb, the peak voltages are reduced by a factor of 2 compared to the AlInAs/GaInAs material system, while high peak-to-valley ratios of 4:1 (17:1) at 300 K (77 K) are maintained. The InAs/AlSb/GaSb material system offers advantages for circuit applications of such devices, particularly operation at lower voltages.<
>