Fully ion-implanted InP JFET with buried p-layer

Implementation of a buried p-layer in a fully ion implanted InP JFET is discussed. Using Be coimplanted with Si, a sharp channel profile is obtained. The saturation current has been reduced, and the pinch-off characteristic has been improved, with a slight decrease in transconductance and cutoff frequency. The equivalent circuits for the JFET with and without the buried p-layer are compared.<
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