Formation of Ni-Zn-Ferrite Films Using Laser Ablation

Ni-Zn-ferrite thin films were formed on glass substrate by a laser ablation method employing a KrF excimer laser at wave-length 248 nm and frequency 15 Hz. Film was deposited on substrate at room temperature, 200°C and 350°C, to a thickness of 2 μm. Ni-Zn-ferrite films thus prepared had the spinel structure when the substrate temperature was raised to 200°C. The saturation magnetic flux densities of Ni-Zn-ferrite films annealed at 400°C were between 1300 and 2020 G. The coercive force of annealed Ni-Zn-ferrite films decreased from 534 to from 70 to 113 Oe as the N
₂
O gas pressure was decreased from 1×10
^-2
Torr to 1×10
^-5
Torr.