Structural and Electro-Optical Properties of ZnO Thin Films

ZnO thin films were grown on different substrates (glass, quartz, silicon wafers, etc) by vacuum thermal evaporation. Different thermal treatments were performed in order to obtain transparent and conductive or high resistive ZnO thin films. The electrical properties of ZnO thin films are dependent on the crucible temperature, annealing conditions and on the substrate nature. The thin films are transparent and have an electrical resistivity in 10
^-4
- 10
^-1
Ωm region. The annealing process performed in vacuum at 573 K or under UV irradiation determines a decrease in the electrical resistivity of films.