Experiment Study of Micro hot-embossing process using GC mold and PC substrate

Micro semi-pyramidal pattern arrays were directly created on the commercially available polymer substrate (polycarbonate, PC) by pressing a glassy carbon (GC) mold in the hot-embossing process with self-made hot-embossing machine. The micro feature of negative cavity on the GC mold was fabricated by Focus Ion Beam technique (FIB). The cavities were approximately 65×70 um at width and 42 um at depth. The space periodicity between the micro cavities is about 120×120 um. By adopting an orthogonal design of experiment method with four parameters of the micro hot-embossing process, each one at three levels was studied. The key parameters which have important influence to the forming result, such as embossing force, embossing temperature, heating time and force holding time were studied. Good forming result was obtained by using a set of optimal parameters according to analysis of experiment data.