3D Embedding and Interconnection of Ultra Thin (≪ 20 μm) Silicon Dies

This paper presents the process for the embedding of thin dies in a polymeric layer developed at IMEC. The different aspects of the fabrication process are described: the die thinning and singulation as well as the embedding itself including the redistribution of the thin die contacts. The embedding build-up is composed of photosensitive dielectric BCB and copper plated metal films. Thinning, singulation and embedding of 15 μm thick Si dies is shown and electrical connection to pads having a pitch of 60 μm is demonstrated.