Electromigration Reliability and Morphologies of 62Sn–36Pb–2Ni and 62Sn–36Pb–2Cu Flip-Chip Solder Joints

The near-eutectic Sn-Pb-Cu and Sn-Pb-Ni ternary solder alloys were developed based on the consideration of strength and fatigue reliability enhancement of solder joints in part via the altering of formation of interfacial intermetallic compounds. In this work, we examine electromigration reliability and morphologies of 62Sn-36Pb-2Ni and 62Sn-36Pb-2Cu flip-chip solder joints subjected to two test conditions that combine different average current densities and ambient temperatures: 5 kA/cm
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at 150 degC and 20 kA/cm
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at 3 degC. Under the test condition of 5 kA/cm
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at 150 degC, 62Sn-36Pb-2Cu is overwhelmingly better than 62Sn-36Pb-2Ni in terms of electromigration reliability. However, under the test condition of 20 kA/cm2 at 30 degC, the electromigration fatigue life of 62Sn-36Pb-2Ni shows a profuse enhancement and exceeds that of 62Sn-36Pb-2Cu. Electromigration-induced morphologies are also examined on the cross sections of solder joints using scanning electron microscopy.