Guest Editors' Introduction: IR Drop in Very Deep-Submicron Designs

As technology scales to 22 nm and functional density continues to rise, many factors and parameters have a direct impact on the design and test of chips. Among such challenges, IR-drop and power supply noise (PSN) effects have become more significant in recent years. This special issue addresses some of the key issues in this area, focusing on the impact of PSN on design and test of very deep-submicron designs, and highlighting the importance of PSN and IR drop to design and test engineers in the semiconductor industry and academic researchers.