A Pattern Generator for E-Beam Lithography Using a Scanning Electron Microscope

A novel microcomputer-controlled vector scan pattern generator is described for the quick conversion of a Cambridge Stereoscan type of scanning electron microscope into an
E
-beam microlithography system, for use in a research environment or small production laboratory. A field size of up to 1 mm X 1 mm is employed, for circuit patterns appropriate to specialized high frequency, or other, planar devices. Scanning procedures and shapes can be software programmed into the pattern generator for ready application to pattern data development, while allowing substantial savings in memory storage requirements. Pattern data may be entered in decimal coordinates via a keyboard/display interface and monitor program, which allows subsequent storage of the coded data on cassette tape.