Growth and field emission properties of carbon nanotubes on glass substrate of Ni catalyst layer using PECVD

The effects of NH
₃
on the growth characteristics of carbon nanotubes (CNTs) were systematically investigated in plasma enhanced chemical vapor deposition (PECVD) with C
₂
H
₂
as a carbon source. The well aligned CNTs were grown from the Ni nanoparticles by plasma-enhanced chemical vapor deposition (PECVD). CNT films were formed with uniform surface morphology instead of nanotube-features. High-resolution transmission electron microscopy revealed that nanotubes grow from the boot with high adhesive ability. The lowest suitable growth temperature is around 560degC. The threshold field is smaller than 2 v/mum, the current within linear extend is from 200 to 700 mA. The luminescence of the CNTs film is not uniform, which resulted from the reduction of field screening effect