Process Control Monitor to Device Data Correlation

Process Control Monitor (PCM) to device modeling is used as an aid in selecting wafers for testing to meet high throughput demands. It can also be used to check for design centering and to facilitate lot starts to meet demand. The output from the model is based on early information provided from PCM testing of the wafer during wafer fabrication. Additionally, the model output can be used to provide an FMA flag, for wafers that have low yield when they are predicted to have high yield. Wafers have limits on PCM parameters. It was found, however, that these limits did not always guarantee a good wafer.