Litholab: a new environment for micro-lithography modeling

With minimum feature sizing down, more advanced configurations are used in micro-lithographic systems. It is harder than before to build an accurate lithography model. In this paper, a new micro-lithography modeling environment is introduced, which provides a set of handy tools to easily customize and build models for micro-lithographic system with advanced configurations. The ability and structure of the environment are described in detail. Examples show the efficiency and accuracy of the environment