Embedded channel polyimide waveguide fabrication by direct electron beam writing method

A new embedded channel polyimide waveguide fabrication process by a direct electron beam writing method (DEBWM) is described. The new technique uses an electron-beam induced effect to directly alter the refractive indices of the two-layer polyimide. Both the core and the lower cladding have been fabricated at the same time in two-layer polyimides using electron beam with 25 keV energy. The obtained embedded channel waveguide was made of two kinds of polyimides, one for lower cladding and one for core and other claddings. Guide losses are 0.3 dB/cm for both TE and TM polarized incident lights and guiding mode is single-mode for TE. The optical properties of the waveguide and a relationship between the doses of electron beam and optical losses or loss dependence on wavelength are also mentioned.<
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