Preparation of a new organic/inorganic hybrid film PVDF/SiO/sub 2/ by sol-gel process

We have developed a new technology related to the sol-gel process for manufacturing hybrid film PVDF/SiO/sub 2/. This hybrid film is a new dielectric film, and has remarkable dielectric and flexible features. In our experiment, it is found that the solution viscosity of SiO/sub 2/ and PVDF is one of the most important factors for forming high quality hybrid film PVDF/SiO/sub 2/. The experimental results show: hybrid film PVDF/SiO/sub 2/ is transparent and flexible, its dielectric constant /spl epsiv/=2.81/spl sim/8.57, and dissipation factor tan /spl delta/ is less than 1/spl times/10/sup -4/ at 1 MHz with 1:1 weight fraction of PVDF/SiO/sub 2/.<
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